Lithographic apparatus, device manufacturing method and positioning system

A lithographic apparatus includes a positioning system including a first and second electromagnetic actuator. Each actuator includes two mutually co-operating electromagnetical elements which are movable with respect to one another due to force acting on the elements of the respective actuator. At l...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BUIS EDWIN JOHAN, HOL SVEN ANTOIN JOHAN, VREUGDEWATER PATRICIA
Format: Patent
Sprache:eng
Schlagworte:
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