Methods for fabricating magnetic cell junctions and a structure resulting and/or used for such methods

Methods for patterning a magnetic cell junction and a topography used for and/or resulting from such methods are provided. In particular, a method is provided which includes etching portions of a topography adjacent to a patterned photoresist layer to a level within a cap film of the topography, rem...

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Bibliographische Detailangaben

Hauptverfasser:	CHOI CHANG JU, CHUNG HELEN L, PARAMESHWARAN BIJU, CHEN EUGENE Y, OUNADJELA KAMEL, SCHWARZ BENJAMIN C. E, GEHA SAM, KULA WITOLD
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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