Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes an illumination system configured to condition a radiation beam, and a support structure constructed to support a patterning device. The patterning device imparts the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate...

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1. Verfasser: EUSSEN EMIEL JOZEF MELANIE
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ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHY
PHYSICS
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creator EUSSEN EMIEL JOZEF MELANIE
description A lithographic apparatus includes an illumination system configured to condition a radiation beam, and a support structure constructed to support a patterning device. The patterning device imparts the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system projects the patterned radiation beam onto a target portion of the substrate. An interferometer system measures a position of the substrate table, and generates a disturbance frequency by optical feedback. A position control system controls the position of the support structure and the substrate table on the basis of the position measurement of the interferometer system. The position control system selects a substrate table speed to prevent a positioning error due to the disturbance frequency.
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subjects ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHY
PHYSICS
title Lithographic apparatus and device manufacturing method
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