Structure for controlling the interface roughness of cobalt disilicide

A method of producing electrical contacts having reduced interface roughness as well as the electrical contacts themselves are disclosed herein. The method of the present invention comprises (a) forming an alloy layer having the formula MX, wherein M is a metal selected from the group consisting of...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CARRUTHERS ROY ARTHUR, AGNELLO PAUL DAVID, ROY RONNEN ANDREW, LAVOIE CHRISTIAN, PETERSON KIRK DAVID, HARPER JAMES MCKELL EDWIN, JORDAN-SWEET JEAN LOUISE, CABRAL, JR. CYRIL, WANG YUN YU, PURTELL ROBERT JOSEPH
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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