Semiconductor device, semiconductor substrate and fabrication process of a semiconductor device

A semiconductor device includes a first insulation layer including a first conductor pattern, a second insulation layer formed on the first insulation layer and including a second conductor pattern, and a third conductor pattern formed on the second insulation layer, wherein there is formed a first...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KIRIKOSHI KATSUYOSHI, KAWAMURA EIICHI
Format: Patent
Sprache:eng
Schlagworte:
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