Method of fabricating a contact with a post contact plug anneal

The present invention provides a process for fabricating a contact plug in a semiconductor substrate having a contact opening formed therein that comprises depositing a barrier layer in the contact opening and on at least a portion of the semiconductor substrate, depositing a contact metal on the ba...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OH MINSEOK, NGUYENPHU BINH, MERCHANT SAILESH M
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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