Dynamic metrology sampling techniques for identified lots, and system for performing same

Methods of using dynamic metrology sampling techniques for identified lots, and a system for performing such methods are disclosed. In one illustrative embodiment, the method comprises identifying at least one wafer to be processed, identifying a process tool in which at least one wafer is to be pro...

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Bibliographische Detailangaben
Hauptverfasser: CASTLE HOWARD E, JENKINS NAOMI M
Format: Patent
Sprache:eng
Schlagworte:
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