Photomask for reducing power supply voltage fluctuations in an integrated circuit and integrated circuit manufactured with the same
A photomask for reducing power supply voltage fluctuations in an integrated circuit and integrated circuit manufactured by the same are disclosed. The photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pa...
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| creator | RITTMAN DANNY OREN MICHA |
| description | A photomask for reducing power supply voltage fluctuations in an integrated circuit and integrated circuit manufactured by the same are disclosed. The photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pattern file created by analyzing a pattern in a mask layout file to identify a region in the pattern to add one or more decoupling capacitors. Once the region is identified, a feature located in the identified region is moved based on a design rule from a first position to a second position in the mask layout file to create a space in the identified region. The decoupling capacitors are placed in the space in the identified region. |
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The photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pattern file created by analyzing a pattern in a mask layout file to identify a region in the pattern to add one or more decoupling capacitors. Once the region is identified, a feature located in the identified region is moved based on a design rule from a first position to a second position in the mask layout file to create a space in the identified region. The decoupling capacitors are placed in the space in the identified region.</description><edition>7</edition><language>eng</language><subject>CALCULATING ; COMPUTING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; PHYSICS</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050607&DB=EPODOC&CC=US&NR=6904582B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050607&DB=EPODOC&CC=US&NR=6904582B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RITTMAN DANNY</creatorcontrib><creatorcontrib>OREN MICHA</creatorcontrib><title>Photomask for reducing power supply voltage fluctuations in an integrated circuit and integrated circuit manufactured with the same</title><description>A photomask for reducing power supply voltage fluctuations in an integrated circuit and integrated circuit manufactured by the same are disclosed. The photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pattern file created by analyzing a pattern in a mask layout file to identify a region in the pattern to add one or more decoupling capacitors. Once the region is identified, a feature located in the identified region is moved based on a design rule from a first position to a second position in the mask layout file to create a space in the identified region. The decoupling capacitors are placed in the space in the identified region.</description><subject>CALCULATING</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC DIGITAL DATA PROCESSING</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2005</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjb0KAjEQhK-xEPUd9gUE_9FWUSwFtT6W3CYXzGVDsvGw9sVNYWlhMwMf3zDD6n1pWbjD9ADNESI1WVlvIHBPEVIOwb3gyU7QEGiXlWQUyz6B9YC-pJCJKNSAslFlK4U2v3CHPmss-_IBvZUWpCVI2NG4Gmh0iSbfHlVwOt4O5ykFrikFVORJ6vt1s5ut1tvFfr78Q_kAWmJLSA</recordid><startdate>20050607</startdate><enddate>20050607</enddate><creator>RITTMAN DANNY</creator><creator>OREN MICHA</creator><scope>EVB</scope></search><sort><creationdate>20050607</creationdate><title>Photomask for reducing power supply voltage fluctuations in an integrated circuit and integrated circuit manufactured with the same</title><author>RITTMAN DANNY ; OREN MICHA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US6904582B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2005</creationdate><topic>CALCULATING</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTRIC DIGITAL DATA PROCESSING</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>RITTMAN DANNY</creatorcontrib><creatorcontrib>OREN MICHA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RITTMAN DANNY</au><au>OREN MICHA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Photomask for reducing power supply voltage fluctuations in an integrated circuit and integrated circuit manufactured with the same</title><date>2005-06-07</date><risdate>2005</risdate><abstract>A photomask for reducing power supply voltage fluctuations in an integrated circuit and integrated circuit manufactured by the same are disclosed. The photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pattern file created by analyzing a pattern in a mask layout file to identify a region in the pattern to add one or more decoupling capacitors. Once the region is identified, a feature located in the identified region is moved based on a design rule from a first position to a second position in the mask layout file to create a space in the identified region. The decoupling capacitors are placed in the space in the identified region.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING PHYSICS |
| title | Photomask for reducing power supply voltage fluctuations in an integrated circuit and integrated circuit manufactured with the same |
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