Test apparatus and method to check the exposure quality of exposed film

The invention relates to a test apparatus for the checking of the exposure quality of an exposed film, in particular of a motion film. A test pattern holder serves for the holding of a test pattern of the exposed film. A reference pattern with at least one reference mark is provided in superimposition with respect to the test pattern held by the test pattern holder. A light transmitter serves for the illumination of the test pattern held by the test pattern holder and of the reference pattern superimposed herewith. A light receiver is provided for the reception of the light transmitted through the reference pattern and through the test pattern and for the generation of corresponding electrical received signals. An evaluation device evaluates these received signals with respect to at least one quality parameter. The invention furthermore relates to a corresponding test method.