Plasma source with reliable ignition
The invention relates to a plasma source whose plasma is ignited by an electric voltage. To be able to carry out the ignition at relatively low voltages, a plate (5) provided with holes (13, 14) is provided beneath a plasma volume (17), which is disposed above a wall (21) of a plasma chamber (3). Th...
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| creator | WEINRICH WERNER BECKMANN RUDOLF FUHR MARKUS ZULTZKE WALTER |
| description | The invention relates to a plasma source whose plasma is ignited by an electric voltage. To be able to carry out the ignition at relatively low voltages, a plate (5) provided with holes (13, 14) is provided beneath a plasma volume (17), which is disposed above a wall (21) of a plasma chamber (3). Through this plate (5) an ignition volume (16) is formed beneath the plasma volume (17) with a higher pressure than in the plasma volume (17), in which the plasma ignites first. The ignition is subsequently propagated through the holes of the plate (5) into the plasma volume (17). |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US6841942B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US6841942B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US6841942B23</originalsourceid><addsrcrecordid>eNrjZFAJyEkszk1UKM4vLUpOVSjPLMlQKErNyUxMyklVyEzPyyzJzM_jYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxocFmFiaGliZGTkbGRCgBANCqJq0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Plasma source with reliable ignition</title><source>esp@cenet</source><creator>WEINRICH WERNER ; BECKMANN RUDOLF ; FUHR MARKUS ; ZULTZKE WALTER</creator><creatorcontrib>WEINRICH WERNER ; BECKMANN RUDOLF ; FUHR MARKUS ; ZULTZKE WALTER</creatorcontrib><description>The invention relates to a plasma source whose plasma is ignited by an electric voltage. To be able to carry out the ignition at relatively low voltages, a plate (5) provided with holes (13, 14) is provided beneath a plasma volume (17), which is disposed above a wall (21) of a plasma chamber (3). Through this plate (5) an ignition volume (16) is formed beneath the plasma volume (17) with a higher pressure than in the plasma volume (17), in which the plasma ignites first. The ignition is subsequently propagated through the holes of the plate (5) into the plasma volume (17).</description><edition>7</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050111&DB=EPODOC&CC=US&NR=6841942B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050111&DB=EPODOC&CC=US&NR=6841942B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WEINRICH WERNER</creatorcontrib><creatorcontrib>BECKMANN RUDOLF</creatorcontrib><creatorcontrib>FUHR MARKUS</creatorcontrib><creatorcontrib>ZULTZKE WALTER</creatorcontrib><title>Plasma source with reliable ignition</title><description>The invention relates to a plasma source whose plasma is ignited by an electric voltage. To be able to carry out the ignition at relatively low voltages, a plate (5) provided with holes (13, 14) is provided beneath a plasma volume (17), which is disposed above a wall (21) of a plasma chamber (3). Through this plate (5) an ignition volume (16) is formed beneath the plasma volume (17) with a higher pressure than in the plasma volume (17), in which the plasma ignites first. The ignition is subsequently propagated through the holes of the plate (5) into the plasma volume (17).</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2005</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAJyEkszk1UKM4vLUpOVSjPLMlQKErNyUxMyklVyEzPyyzJzM_jYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxocFmFiaGliZGTkbGRCgBANCqJq0</recordid><startdate>20050111</startdate><enddate>20050111</enddate><creator>WEINRICH WERNER</creator><creator>BECKMANN RUDOLF</creator><creator>FUHR MARKUS</creator><creator>ZULTZKE WALTER</creator><scope>EVB</scope></search><sort><creationdate>20050111</creationdate><title>Plasma source with reliable ignition</title><author>WEINRICH WERNER ; BECKMANN RUDOLF ; FUHR MARKUS ; ZULTZKE WALTER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US6841942B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2005</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>WEINRICH WERNER</creatorcontrib><creatorcontrib>BECKMANN RUDOLF</creatorcontrib><creatorcontrib>FUHR MARKUS</creatorcontrib><creatorcontrib>ZULTZKE WALTER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WEINRICH WERNER</au><au>BECKMANN RUDOLF</au><au>FUHR MARKUS</au><au>ZULTZKE WALTER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Plasma source with reliable ignition</title><date>2005-01-11</date><risdate>2005</risdate><abstract>The invention relates to a plasma source whose plasma is ignited by an electric voltage. To be able to carry out the ignition at relatively low voltages, a plate (5) provided with holes (13, 14) is provided beneath a plasma volume (17), which is disposed above a wall (21) of a plasma chamber (3). Through this plate (5) an ignition volume (16) is formed beneath the plasma volume (17) with a higher pressure than in the plasma volume (17), in which the plasma ignites first. The ignition is subsequently propagated through the holes of the plate (5) into the plasma volume (17).</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Plasma source with reliable ignition |
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