Process-robust alignment mark structure for semiconductor wafers

An alignment mark structure for use upon a semiconductor substrate is disclosed. In an exemplary embodiment, the alignment mark structure includes a plurality of segments arranged in an alignment pattern, with each of the plurality of segments being formed from a base pattern created on the substrat...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WU QIANG, HOLLOWAY KAREN L, LU ANDREW
Format: Patent
Sprache:eng
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