Gas treatment device comprising SMSI material and methods for making and using the same

A gas treatment device, comprises a substrate disposed within a shell. The substrate comprises a catalyst composition comprising a support, a catalyst, and a sufficient amount of SMSI material such that, upon exposure to a gas stream (at a gas treatment device operating temperature), less than or eq...

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Hauptverfasser:	KUPE JOACHIM, LABARGE WILLIAM J, BECKMEYER RICHARD F
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION THEIR RELEVANT APPARATUS TRANSPORTING
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creator	KUPE JOACHIM LABARGE WILLIAM J BECKMEYER RICHARD F
description	A gas treatment device, comprises a substrate disposed within a shell. The substrate comprises a catalyst composition comprising a support, a catalyst, and a sufficient amount of SMSI material such that, upon exposure to a gas stream (at a gas treatment device operating temperature), less than or equal to about 35 wt % of hydrocarbons in the gas stream are burned.A method for forming a gas treatment device, comprises applying a slurry to a substrate, wherein the slurry comprises a support and a sufficient amount of SMSI material such that, upon exposure to a gas stream at a gas treatment device operating temperature, greater than or equal to about 50 wt % of hydrocarbons in the gas stream are cracked to a light fraction; applying a catalyst to the substrate; calcining the catalyst; and disposing the calcined substrate into a shell, with a retention material disposed between the shell and the calcined substrate.
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subjects	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION THEIR RELEVANT APPARATUS TRANSPORTING
title	Gas treatment device comprising SMSI material and methods for making and using the same
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