Gas discharge laser with means for removing gas impurities
In an excimer laser or a molecular fluorine laser, a heating element is used which is heated to temperatures in excess of 60° C., in order to remove impurities from the laser gas.
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | OSMANOW RUSTEM REBHAN ULRICH |
| description | In an excimer laser or a molecular fluorine laser, a heating element is used which is heated to temperatures in excess of 60° C., in order to remove impurities from the laser gas. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US6735233B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US6735233B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US6735233B23</originalsourceid><addsrcrecordid>eNrjZLByTyxWSMksTs5ILEpPVchJLE4tUijPLMlQyE1NzCtWSMsvUihKzc0vy8xLV0gHqs3MLSgtyizJTC3mYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxocFm5samRsbGTkbGRCgBABMgLs0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Gas discharge laser with means for removing gas impurities</title><source>esp@cenet</source><creator>OSMANOW RUSTEM ; REBHAN ULRICH</creator><creatorcontrib>OSMANOW RUSTEM ; REBHAN ULRICH</creatorcontrib><description>In an excimer laser or a molecular fluorine laser, a heating element is used which is heated to temperatures in excess of 60° C., in order to remove impurities from the laser gas.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; DEVICES USING STIMULATED EMISSION ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040511&DB=EPODOC&CC=US&NR=6735233B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040511&DB=EPODOC&CC=US&NR=6735233B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OSMANOW RUSTEM</creatorcontrib><creatorcontrib>REBHAN ULRICH</creatorcontrib><title>Gas discharge laser with means for removing gas impurities</title><description>In an excimer laser or a molecular fluorine laser, a heating element is used which is heated to temperatures in excess of 60° C., in order to remove impurities from the laser gas.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLByTyxWSMksTs5ILEpPVchJLE4tUijPLMlQyE1NzCtWSMsvUihKzc0vy8xLV0gHqs3MLSgtyizJTC3mYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxocFm5samRsbGTkbGRCgBABMgLs0</recordid><startdate>20040511</startdate><enddate>20040511</enddate><creator>OSMANOW RUSTEM</creator><creator>REBHAN ULRICH</creator><scope>EVB</scope></search><sort><creationdate>20040511</creationdate><title>Gas discharge laser with means for removing gas impurities</title><author>OSMANOW RUSTEM ; REBHAN ULRICH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US6735233B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2004</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>OSMANOW RUSTEM</creatorcontrib><creatorcontrib>REBHAN ULRICH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OSMANOW RUSTEM</au><au>REBHAN ULRICH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Gas discharge laser with means for removing gas impurities</title><date>2004-05-11</date><risdate>2004</risdate><abstract>In an excimer laser or a molecular fluorine laser, a heating element is used which is heated to temperatures in excess of 60° C., in order to remove impurities from the laser gas.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US6735233B2 |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Gas discharge laser with means for removing gas impurities |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T02%3A32%3A42IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=OSMANOW%20RUSTEM&rft.date=2004-05-11&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS6735233B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |