Dual-member pellicle assemblies and methods of use

Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths either within or outside the visible spectrum include a pellicle that is removed during exposure. The pellicle sheet can be transparent or opaque. In one embodiment, a pellicle assembly compri...

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Bibliographische Detailangaben

Hauptverfasser:	CULLINS JERRY C, MUZIO EDWARD
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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