System and method for producing thin film patterns interspersed with voids to admit light to otherwise shadowed regions

A metallized pattern, used as an electrical conductor, is altered by means of standard lithographic processes to have regions of interspersed missing metal, or voids, in a specified region of the pattern. The voids in the conducting pattern allow radiation, emanating from various angles, to penetrat...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: GLOWNIA JAMES H, DOYLE JAMES P, VON GUTFELD ROBERT J
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!