Method for fabricating a semiconductor device with an air tunnel formed in the lower part of a transistor channel

A method for fabricating a semiconductor device, which improves the threshold voltage by forming an air tunnel in the lower part of the transistor channel of a semiconductor device, and also improves the short channel effect by making better the sub-threshold voltage properties and increasing the in...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YANG KUK-SEUNG, YUN HEE-YONG
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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