Resist coating and recycling method
This invention provides a resist recycling apparatus and the method for resist recycling. A resist recycling apparatus includes a viscosity control tank being supplied with wasted resist liquid, a solvent tank supplying a solvent to the viscosity control tank, a viscometer measuring viscosity of the...
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| creator | OOTA YASUHARU ITO YOSHIZUMI |
| description | This invention provides a resist recycling apparatus and the method for resist recycling. A resist recycling apparatus includes a viscosity control tank being supplied with wasted resist liquid, a solvent tank supplying a solvent to the viscosity control tank, a viscometer measuring viscosity of the resist in the viscosity control tank, a control portion calculating the resin density of the resist according to the viscosity measured by the viscometer and the temperature of the resist, determining an amount of solvent to supply to the viscosity control tank according to the difference between the calculated resin density and a predetermined resin density, and a filter for removing dust from the resist. A method for recycling a resist includes the steps of supplying waste resist to a viscosity control tank, measuring the viscosity of the resist in the viscosity control tank, calculating the resin density according to the measured viscosity and the temperature of the resist in the viscosity control tank, determining the amount of solvent to add to the resist according to the difference between the calculated resin density and the predetermined resin density, supplying a solvent to the viscosity control tank, and removing dust from the resist. |
| format | Patent |
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A resist recycling apparatus includes a viscosity control tank being supplied with wasted resist liquid, a solvent tank supplying a solvent to the viscosity control tank, a viscometer measuring viscosity of the resist in the viscosity control tank, a control portion calculating the resin density of the resist according to the viscosity measured by the viscometer and the temperature of the resist, determining an amount of solvent to supply to the viscosity control tank according to the difference between the calculated resin density and a predetermined resin density, and a filter for removing dust from the resist. A method for recycling a resist includes the steps of supplying waste resist to a viscosity control tank, measuring the viscosity of the resist in the viscosity control tank, calculating the resin density according to the measured viscosity and the temperature of the resist in the viscosity control tank, determining the amount of solvent to add to the resist according to the difference between the calculated resin density and the predetermined resin density, supplying a solvent to the viscosity control tank, and removing dust from the resist.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030107&DB=EPODOC&CC=US&NR=6503568B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030107&DB=EPODOC&CC=US&NR=6503568B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OOTA YASUHARU</creatorcontrib><creatorcontrib>ITO YOSHIZUMI</creatorcontrib><title>Resist coating and recycling method</title><description>This invention provides a resist recycling apparatus and the method for resist recycling. A resist recycling apparatus includes a viscosity control tank being supplied with wasted resist liquid, a solvent tank supplying a solvent to the viscosity control tank, a viscometer measuring viscosity of the resist in the viscosity control tank, a control portion calculating the resin density of the resist according to the viscosity measured by the viscometer and the temperature of the resist, determining an amount of solvent to supply to the viscosity control tank according to the difference between the calculated resin density and a predetermined resin density, and a filter for removing dust from the resist. A method for recycling a resist includes the steps of supplying waste resist to a viscosity control tank, measuring the viscosity of the resist in the viscosity control tank, calculating the resin density according to the measured viscosity and the temperature of the resist in the viscosity control tank, determining the amount of solvent to add to the resist according to the difference between the calculated resin density and the predetermined resin density, supplying a solvent to the viscosity control tank, and removing dust from the resist.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAOSi3OLC5RSM5PLMnMS1dIzEtRKEpNrkzOAfFyU0sy8lN4GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakl8aLCZqYGxqZmFk6ExEUoAmQgmLw</recordid><startdate>20030107</startdate><enddate>20030107</enddate><creator>OOTA YASUHARU</creator><creator>ITO YOSHIZUMI</creator><scope>EVB</scope></search><sort><creationdate>20030107</creationdate><title>Resist coating and recycling method</title><author>OOTA YASUHARU ; ITO YOSHIZUMI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US6503568B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2003</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>OOTA YASUHARU</creatorcontrib><creatorcontrib>ITO YOSHIZUMI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OOTA YASUHARU</au><au>ITO YOSHIZUMI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Resist coating and recycling method</title><date>2003-01-07</date><risdate>2003</risdate><abstract>This invention provides a resist recycling apparatus and the method for resist recycling. A resist recycling apparatus includes a viscosity control tank being supplied with wasted resist liquid, a solvent tank supplying a solvent to the viscosity control tank, a viscometer measuring viscosity of the resist in the viscosity control tank, a control portion calculating the resin density of the resist according to the viscosity measured by the viscometer and the temperature of the resist, determining an amount of solvent to supply to the viscosity control tank according to the difference between the calculated resin density and a predetermined resin density, and a filter for removing dust from the resist. A method for recycling a resist includes the steps of supplying waste resist to a viscosity control tank, measuring the viscosity of the resist in the viscosity control tank, calculating the resin density according to the measured viscosity and the temperature of the resist in the viscosity control tank, determining the amount of solvent to add to the resist according to the difference between the calculated resin density and the predetermined resin density, supplying a solvent to the viscosity control tank, and removing dust from the resist.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Resist coating and recycling method |
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