Support for supporting a substrate in a process chamber

A chamber 30 for processing a substrate 25 comprises a support 55 comprising a dielectric 60 enveloping an electrode 70. The electrode 70 may be chargeable to electrostatically hold the substrate 25 or may be chargeable to form an energized gas in the chamber 30 to process the substrate 25. A base 1...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ASKARI SYED H, KUMAR ANANDA H, BEDI SURINDER S, NARENDRNATH KADTHALA R, GRIMARD DENNIS S, SHAMOUILIAN SHAMOUIL
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATION SEMICONDUCTOR DEVICES
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