SiO2-coated mirror substrate for EUV

Mirror substrate consisting of crystal, especially silicon crystal, on which an amorphous layer, especially a quartz glass layer, is applied.

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Bibliographische Detailangaben
1. Verfasser:	KAISER WINFRIED
Format:	Patent
Sprache:	eng
Schlagworte:	GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	Mirror substrate consisting of crystal, especially silicon crystal, on which an amorphous layer, especially a quartz glass layer, is applied.