Atomic force microscopy and signal acquisition via buried insulator
Analysis of a semiconductor die having silicon-on-insulator (SOI) structure is enhanced by accessing the circuitry within the die from the back side without necessarily breaching the insulator layer of the SOI structure. According to an example embodiment of the present invention, a semiconductor di...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | BRUCE MICHAEL R RING ROSALINDA M BIRDSLEY JEFFREY D DAVIS BRENNAN V STONE DANIEL L |
description | Analysis of a semiconductor die having silicon-on-insulator (SOI) structure is enhanced by accessing the circuitry within the die from the back side without necessarily breaching the insulator layer of the SOI structure. According to an example embodiment of the present invention, a semiconductor die having a SOI structure and a backside opposite circuitry in a circuit side is analyzed. An atomic force microscope is scanned across a thinned portion of the back side. The microscope responds to an electrical characteristic, such as a logic state, coupled from circuitry via the insulator portion of the die over which the microscope is being scanned. The response of the microscope to the die is detected and used to detect an electrical characteristic of the die. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US6448096B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US6448096B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US6448096B13</originalsourceid><addsrcrecordid>eNrjZHB2LMnPzUxWSMsvSk5VALKK8ouT8wsqFRLzUhSKM9PzEnMUEpMLSzOLM0sy8_MUyjITFZJKizJTUxQy84pLcxJL8ot4GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakl8aLCZiYmFgaWZk6ExEUoASAUyrg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Atomic force microscopy and signal acquisition via buried insulator</title><source>esp@cenet</source><creator>BRUCE MICHAEL R ; RING ROSALINDA M ; BIRDSLEY JEFFREY D ; DAVIS BRENNAN V ; STONE DANIEL L</creator><creatorcontrib>BRUCE MICHAEL R ; RING ROSALINDA M ; BIRDSLEY JEFFREY D ; DAVIS BRENNAN V ; STONE DANIEL L</creatorcontrib><description>Analysis of a semiconductor die having silicon-on-insulator (SOI) structure is enhanced by accessing the circuitry within the die from the back side without necessarily breaching the insulator layer of the SOI structure. According to an example embodiment of the present invention, a semiconductor die having a SOI structure and a backside opposite circuitry in a circuit side is analyzed. An atomic force microscope is scanned across a thinned portion of the back side. The microscope responds to an electrical characteristic, such as a logic state, coupled from circuitry via the insulator portion of the die over which the microscope is being scanned. The response of the microscope to the die is detected and used to detect an electrical characteristic of the die.</description><edition>7</edition><language>eng</language><subject>APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM] ; MEASURING ; PHYSICS ; SCANNING-PROBE TECHNIQUES OR APPARATUS ; TESTING</subject><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20020910&DB=EPODOC&CC=US&NR=6448096B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20020910&DB=EPODOC&CC=US&NR=6448096B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BRUCE MICHAEL R</creatorcontrib><creatorcontrib>RING ROSALINDA M</creatorcontrib><creatorcontrib>BIRDSLEY JEFFREY D</creatorcontrib><creatorcontrib>DAVIS BRENNAN V</creatorcontrib><creatorcontrib>STONE DANIEL L</creatorcontrib><title>Atomic force microscopy and signal acquisition via buried insulator</title><description>Analysis of a semiconductor die having silicon-on-insulator (SOI) structure is enhanced by accessing the circuitry within the die from the back side without necessarily breaching the insulator layer of the SOI structure. According to an example embodiment of the present invention, a semiconductor die having a SOI structure and a backside opposite circuitry in a circuit side is analyzed. An atomic force microscope is scanned across a thinned portion of the back side. The microscope responds to an electrical characteristic, such as a logic state, coupled from circuitry via the insulator portion of the die over which the microscope is being scanned. The response of the microscope to the die is detected and used to detect an electrical characteristic of the die.</description><subject>APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM]</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>SCANNING-PROBE TECHNIQUES OR APPARATUS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2002</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHB2LMnPzUxWSMsvSk5VALKK8ouT8wsqFRLzUhSKM9PzEnMUEpMLSzOLM0sy8_MUyjITFZJKizJTUxQy84pLcxJL8ot4GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakl8aLCZiYmFgaWZk6ExEUoASAUyrg</recordid><startdate>20020910</startdate><enddate>20020910</enddate><creator>BRUCE MICHAEL R</creator><creator>RING ROSALINDA M</creator><creator>BIRDSLEY JEFFREY D</creator><creator>DAVIS BRENNAN V</creator><creator>STONE DANIEL L</creator><scope>EVB</scope></search><sort><creationdate>20020910</creationdate><title>Atomic force microscopy and signal acquisition via buried insulator</title><author>BRUCE MICHAEL R ; RING ROSALINDA M ; BIRDSLEY JEFFREY D ; DAVIS BRENNAN V ; STONE DANIEL L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US6448096B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2002</creationdate><topic>APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM]</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>SCANNING-PROBE TECHNIQUES OR APPARATUS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>BRUCE MICHAEL R</creatorcontrib><creatorcontrib>RING ROSALINDA M</creatorcontrib><creatorcontrib>BIRDSLEY JEFFREY D</creatorcontrib><creatorcontrib>DAVIS BRENNAN V</creatorcontrib><creatorcontrib>STONE DANIEL L</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BRUCE MICHAEL R</au><au>RING ROSALINDA M</au><au>BIRDSLEY JEFFREY D</au><au>DAVIS BRENNAN V</au><au>STONE DANIEL L</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Atomic force microscopy and signal acquisition via buried insulator</title><date>2002-09-10</date><risdate>2002</risdate><abstract>Analysis of a semiconductor die having silicon-on-insulator (SOI) structure is enhanced by accessing the circuitry within the die from the back side without necessarily breaching the insulator layer of the SOI structure. According to an example embodiment of the present invention, a semiconductor die having a SOI structure and a backside opposite circuitry in a circuit side is analyzed. An atomic force microscope is scanned across a thinned portion of the back side. The microscope responds to an electrical characteristic, such as a logic state, coupled from circuitry via the insulator portion of the die over which the microscope is being scanned. The response of the microscope to the die is detected and used to detect an electrical characteristic of the die.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US6448096B1 |
source | esp@cenet |
subjects | APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM] MEASURING PHYSICS SCANNING-PROBE TECHNIQUES OR APPARATUS TESTING |
title | Atomic force microscopy and signal acquisition via buried insulator |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-01T19%3A07%3A01IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=BRUCE%20MICHAEL%20R&rft.date=2002-09-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS6448096B1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |