Apparatus and method for drying wafers by a solvent

Apparatus and method for drying wafers by a solvent

An apparatus for drying semiconductor wafers in a solvent drying chamber and a method for drying are disclosed. The apparatus is equipped with an alarm/interlocking system such that when a flow of the solvent vapor into the drying chamber is stopped, the alarm is triggered and the interlocking syste...

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Hauptverfasser: CHEN CHOING, CHOU LIANG-YI, CHENG CHIH-HONG, JU JENN-WEI, YANG SHIN-SHING
Format: Patent
Sprache:eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator CHEN CHOING
CHOU LIANG-YI
CHENG CHIH-HONG
JU JENN-WEI
YANG SHIN-SHING
description An apparatus for drying semiconductor wafers in a solvent drying chamber and a method for drying are disclosed. The apparatus is equipped with an alarm/interlocking system such that when a flow of the solvent vapor into the drying chamber is stopped, the alarm is triggered and the interlocking system is activated to stop the further loading of wafers into the drying chamber and thus preventing the outputting of undried wafers from the chamber. The apparatus is used to prevent any malfunction in the flow control valves or in any other flow control system that stops the flow of solvent vapor into the drying chamber.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Apparatus and method for drying wafers by a solvent
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