Method and apparatus for monitoring plasma processing operations

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength sh...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WARD PAMELA DENISE PEARDON, STEVENSON JOEL O'DON, SMITH, JR. MICHAEL LANE
Format:	Patent
Sprache:	eng
Schlagworte:	COLORIMETRY MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING PHYSICS RADIATION PYROMETRY TESTING
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