Method of determining accuracy error in line width metrology device

A method of determining the accuracy error in scanning signals of a semiconductor line width metrology device comprises the steps of creating a frequency signature template of a patterned feature formed on a semiconductor layer with a line width metrology measurement device that is in nominal operat...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MCINTOSH JOHN M, KANE BRITTIN C
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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