Method for forming integrated circuit device structures from semiconductor substrate oxidation mask layers

A method for forming integrated circuit device structures upon active semiconductor regions of a semiconductor substrate. The active semiconductor regions are defined by Field OXide (FOX) isolation regions which are formed through a Polysilicon Buffered LOCal Oxidation of Silicon (PBLOCOS) oxidation...

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Bibliographische Detailangaben

Hauptverfasser:	PAN YANG, WEI CHEIA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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