Optical system, in particular projection-exposure unit used in microlithography
An optical system, in particular for projection-exposure units used in microlithography, in particular with a slot-shaped field of view or non-rotationally symmetrical illumination, has an optical element 1, in particular a lens or a mirror, which is arranged in a mount 7 or an inner ring 2, and act...
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| creator | MERZ ERICH BECKER JOCHEN |
| description | An optical system, in particular for projection-exposure units used in microlithography, in particular with a slot-shaped field of view or non-rotationally symmetrical illumination, has an optical element 1, in particular a lens or a mirror, which is arranged in a mount 7 or an inner ring 2, and actuators 8a, 8b and 9a, 9b. A plurality of actuators 8a, 8b and 9a, 9b act on the deformable inner ring 2 via a radial force-displacement transmission 12, 13 in order to generate tensile and/or compressive forces. |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Optical system, in particular projection-exposure unit used in microlithography |
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