System for improving energy purity and implant consistency, and for minimizing charge accumulation of an implanted substrate

A plasma immersion ion implantation method and system is provided for maintaining uniformity in implant energy distribution and for minimizing charge accumulation of an implanted substrate such as a wafer. A voltage modulator (27) applies a pulsed voltage signal (-Vp) to a platen (14) in a process c...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BERNSTEIN JAMES D, KELLERMAN PETER L, DENHOLM A. STUART
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
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