Method of post CMP defect stability improvement

The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substr...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PRABHU GOPALAKRISHNA B, BENNETT DOYLE E, BONNER BENJAMIN A, HUEY SIDNEY, FISHKIN BORIS, OSTERHELD THOMAS H, MCKEEVER PETER, GARRETSON CHARLES C
Format:	Patent
Sprache:	eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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