Methods for decreasing surface roughness in novolak-based resists
Methods of fabricating microelectronic devices comprise applying compositions comprising salt additives and basic components to resists to decrease the surface roughness of the resists and form the microelectronic devices having the resists present therein.
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | REYNOLDS GEOFFREY WILLIAM TAYLOR JAMES WELCH |
| description | Methods of fabricating microelectronic devices comprise applying compositions comprising salt additives and basic components to resists to decrease the surface roughness of the resists and form the microelectronic devices having the resists present therein. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US6162592A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US6162592A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US6162592A3</originalsourceid><addsrcrecordid>eNrjZHD0TS3JyE8pVkjLL1JISU0uSk0szsxLVyguLUpLTE5VKMovTc_ISy0uVsjMU8jLL8vPSczWTUosTk1RKEotziwuKeZhYE1LzClO5YXS3Azybq4hzh66qQX58anFBUBT8lJL4kODzQzNjEwtjRyNCasAAHG9MXE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Methods for decreasing surface roughness in novolak-based resists</title><source>esp@cenet</source><creator>REYNOLDS; GEOFFREY WILLIAM ; TAYLOR; JAMES WELCH</creator><creatorcontrib>REYNOLDS; GEOFFREY WILLIAM ; TAYLOR; JAMES WELCH</creatorcontrib><description>Methods of fabricating microelectronic devices comprise applying compositions comprising salt additives and basic components to resists to decrease the surface roughness of the resists and form the microelectronic devices having the resists present therein.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2000</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20001219&DB=EPODOC&CC=US&NR=6162592A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20001219&DB=EPODOC&CC=US&NR=6162592A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>REYNOLDS; GEOFFREY WILLIAM</creatorcontrib><creatorcontrib>TAYLOR; JAMES WELCH</creatorcontrib><title>Methods for decreasing surface roughness in novolak-based resists</title><description>Methods of fabricating microelectronic devices comprise applying compositions comprising salt additives and basic components to resists to decrease the surface roughness of the resists and form the microelectronic devices having the resists present therein.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2000</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD0TS3JyE8pVkjLL1JISU0uSk0szsxLVyguLUpLTE5VKMovTc_ISy0uVsjMU8jLL8vPSczWTUosTk1RKEotziwuKeZhYE1LzClO5YXS3Azybq4hzh66qQX58anFBUBT8lJL4kODzQzNjEwtjRyNCasAAHG9MXE</recordid><startdate>20001219</startdate><enddate>20001219</enddate><creator>REYNOLDS; GEOFFREY WILLIAM</creator><creator>TAYLOR; JAMES WELCH</creator><scope>EVB</scope></search><sort><creationdate>20001219</creationdate><title>Methods for decreasing surface roughness in novolak-based resists</title><author>REYNOLDS; GEOFFREY WILLIAM ; TAYLOR; JAMES WELCH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US6162592A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2000</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>REYNOLDS; GEOFFREY WILLIAM</creatorcontrib><creatorcontrib>TAYLOR; JAMES WELCH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>REYNOLDS; GEOFFREY WILLIAM</au><au>TAYLOR; JAMES WELCH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methods for decreasing surface roughness in novolak-based resists</title><date>2000-12-19</date><risdate>2000</risdate><abstract>Methods of fabricating microelectronic devices comprise applying compositions comprising salt additives and basic components to resists to decrease the surface roughness of the resists and form the microelectronic devices having the resists present therein.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US6162592A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Methods for decreasing surface roughness in novolak-based resists |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T02%3A53%3A00IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=REYNOLDS;%20GEOFFREY%20WILLIAM&rft.date=2000-12-19&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS6162592A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |