Pedestal insulator for a pre-clean chamber

The invention generally provides an apparatus that reduces backside sputtering of the substrate in a pre-clean chamber and other etch chambers. The invention also provides an apparatus that reduces flaking of material from the film formed on the surfaces of the process kit and extends the specified...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NGAN, KENNY KING-TAI, NARASIMHAN, MURALI, COHEN, BARNEY M, AL-SHARIF, MOHAMED A, STIMSON, BRADLEY O, GHOSH, DEBABRATA
Format: Patent
Sprache:eng
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