Process for fabricating vertical transistors

A process for fabricating a vertical MOSFET device for use in integrated circuits is disclosed. In the process, at least three layers of material are formed sequentially on a semiconductor substrate. The three layers are arranged such that the second layer is interposed between the first and third l...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MONROE, DONALD PAUL, HERGENROTHER, JOHN M
Format: Patent
Sprache:eng
Schlagworte:
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