Method and apparatus for detecting arcs
The present invention is a thin film deposition tool with arc detection capabilities. An arc detector is provided in the power supply line between the power supply and the sputter deposition tool. Arcs are detected by the arc detector and counted using a logic circuit. Arc data is collected and anal...
Gespeichert in:
Hauptverfasser: | , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | MURPHY WILLIAM J ABRY CHARLES R SEWARD JEFFREY N |
description | The present invention is a thin film deposition tool with arc detection capabilities. An arc detector is provided in the power supply line between the power supply and the sputter deposition tool. Arcs are detected by the arc detector and counted using a logic circuit. Arc data is collected and analyzed and real-time data is provided which can be used to stop further processing until a repair is made. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US5993615A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US5993615A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US5993615A3</originalsourceid><addsrcrecordid>eNrjZFD3TS3JyE9RSMwD4oKCxKLEktJihbT8IoWU1JLU5JLMvHSFxKLkYh4G1rTEnOJUXijNzSDv5hri7KGbWpAfn1pckJicmpdaEh8abGppaWxmaOpoTFgFAPjqJzA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method and apparatus for detecting arcs</title><source>esp@cenet</source><creator>MURPHY; WILLIAM J ; ABRY; CHARLES R ; SEWARD; JEFFREY N</creator><creatorcontrib>MURPHY; WILLIAM J ; ABRY; CHARLES R ; SEWARD; JEFFREY N</creatorcontrib><description>The present invention is a thin film deposition tool with arc detection capabilities. An arc detector is provided in the power supply line between the power supply and the sputter deposition tool. Arcs are detected by the arc detector and counted using a logic circuit. Arc data is collected and analyzed and real-time data is provided which can be used to stop further processing until a repair is made.</description><edition>6</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19991130&DB=EPODOC&CC=US&NR=5993615A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19991130&DB=EPODOC&CC=US&NR=5993615A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MURPHY; WILLIAM J</creatorcontrib><creatorcontrib>ABRY; CHARLES R</creatorcontrib><creatorcontrib>SEWARD; JEFFREY N</creatorcontrib><title>Method and apparatus for detecting arcs</title><description>The present invention is a thin film deposition tool with arc detection capabilities. An arc detector is provided in the power supply line between the power supply and the sputter deposition tool. Arcs are detected by the arc detector and counted using a logic circuit. Arc data is collected and analyzed and real-time data is provided which can be used to stop further processing until a repair is made.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFD3TS3JyE9RSMwD4oKCxKLEktJihbT8IoWU1JLU5JLMvHSFxKLkYh4G1rTEnOJUXijNzSDv5hri7KGbWpAfn1pckJicmpdaEh8abGppaWxmaOpoTFgFAPjqJzA</recordid><startdate>19991130</startdate><enddate>19991130</enddate><creator>MURPHY; WILLIAM J</creator><creator>ABRY; CHARLES R</creator><creator>SEWARD; JEFFREY N</creator><scope>EVB</scope></search><sort><creationdate>19991130</creationdate><title>Method and apparatus for detecting arcs</title><author>MURPHY; WILLIAM J ; ABRY; CHARLES R ; SEWARD; JEFFREY N</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US5993615A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>MURPHY; WILLIAM J</creatorcontrib><creatorcontrib>ABRY; CHARLES R</creatorcontrib><creatorcontrib>SEWARD; JEFFREY N</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MURPHY; WILLIAM J</au><au>ABRY; CHARLES R</au><au>SEWARD; JEFFREY N</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and apparatus for detecting arcs</title><date>1999-11-30</date><risdate>1999</risdate><abstract>The present invention is a thin film deposition tool with arc detection capabilities. An arc detector is provided in the power supply line between the power supply and the sputter deposition tool. Arcs are detected by the arc detector and counted using a logic circuit. Arc data is collected and analyzed and real-time data is provided which can be used to stop further processing until a repair is made.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US5993615A |
source | esp@cenet |
subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Method and apparatus for detecting arcs |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-30T03%3A49%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MURPHY;%20WILLIAM%20J&rft.date=1999-11-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS5993615A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |