Chemical mechanical polishing carrier fixture and system
A carrier fixture that does not include transport channels or openings for directing a slurry to a substrate being polished. The carrier fixture may have an inner support coupled to a ring member that contacts a substrate during polishing. The carrier fixture may also have outer supports coupled to...
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| creator | CREVASSE ANNETTE MARGARET EASTER WILLIAM GRAHAM MAZE, III JOHN ALBERT SOWELL JOHN THOMAS |
| description | A carrier fixture that does not include transport channels or openings for directing a slurry to a substrate being polished. The carrier fixture may have an inner support coupled to a ring member that contacts a substrate during polishing. The carrier fixture may also have outer supports coupled to the ring member. The carrier fixture is used to manufacture integrated circuits. |
| format | Patent |
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The carrier fixture may have an inner support coupled to a ring member that contacts a substrate during polishing. The carrier fixture may also have outer supports coupled to the ring member. The carrier fixture is used to manufacture integrated circuits.</description><edition>6</edition><language>eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990914&DB=EPODOC&CC=US&NR=5951382A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990914&DB=EPODOC&CC=US&NR=5951382A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CREVASSE; ANNETTE MARGARET</creatorcontrib><creatorcontrib>EASTER; WILLIAM GRAHAM</creatorcontrib><creatorcontrib>MAZE, III; JOHN ALBERT</creatorcontrib><creatorcontrib>SOWELL; JOHN THOMAS</creatorcontrib><title>Chemical mechanical polishing carrier fixture and system</title><description>A carrier fixture that does not include transport channels or openings for directing a slurry to a substrate being polished. The carrier fixture may have an inner support coupled to a ring member that contacts a substrate during polishing. The carrier fixture may also have outer supports coupled to the ring member. The carrier fixture is used to manufacture integrated circuits.</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBwzkjNzUxOzFHITU3OSMwDMwvyczKLMzLz0hWSE4uKMlOLFNIyK0pKi1IVEvNSFIori0tSc3kYWNMSc4pTeaE0N4O8m2uIs4duakF-fGpxQWJyal5qSXxosKmlqaGxhZGjMWEVAHeLLfo</recordid><startdate>19990914</startdate><enddate>19990914</enddate><creator>CREVASSE; ANNETTE MARGARET</creator><creator>EASTER; WILLIAM GRAHAM</creator><creator>MAZE, III; JOHN ALBERT</creator><creator>SOWELL; JOHN THOMAS</creator><scope>EVB</scope></search><sort><creationdate>19990914</creationdate><title>Chemical mechanical polishing carrier fixture and system</title><author>CREVASSE; ANNETTE MARGARET ; EASTER; WILLIAM GRAHAM ; MAZE, III; JOHN ALBERT ; SOWELL; JOHN THOMAS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US5951382A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>CREVASSE; ANNETTE MARGARET</creatorcontrib><creatorcontrib>EASTER; WILLIAM GRAHAM</creatorcontrib><creatorcontrib>MAZE, III; JOHN ALBERT</creatorcontrib><creatorcontrib>SOWELL; JOHN THOMAS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CREVASSE; ANNETTE MARGARET</au><au>EASTER; WILLIAM GRAHAM</au><au>MAZE, III; JOHN ALBERT</au><au>SOWELL; JOHN THOMAS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Chemical mechanical polishing carrier fixture and system</title><date>1999-09-14</date><risdate>1999</risdate><abstract>A carrier fixture that does not include transport channels or openings for directing a slurry to a substrate being polished. The carrier fixture may have an inner support coupled to a ring member that contacts a substrate during polishing. The carrier fixture may also have outer supports coupled to the ring member. The carrier fixture is used to manufacture integrated circuits.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| language | eng |
| recordid | cdi_epo_espacenet_US5951382A |
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| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
| title | Chemical mechanical polishing carrier fixture and system |
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