Electrostatic clamping method and apparatus for dielectric workpieces in vacuum processors

A dielectric workpiece is clamped to a holder in a vacuum plasma processor chamber by applying the plasma to a surface of the workpiece exposed to the plasma simultaneously with applying a relatively high voltage to an electrode on the holder. The electrode is in close proximity to a portion of the...

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Bibliographische Detailangaben
Hauptverfasser: BARNES, MICHAEL S, SHUFFLEBOTHAM, PAUL KEVIN
Format: Patent
Sprache:eng
Schlagworte:
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