High aspect ratio metal microstructures and method for preparing the same

High aspect ratio metal microstructures may be prepared by a method involving (i) forming a layer of a photoresist on a substrate; (ii) exposing the layer to actinic radiation in an imagewise manner and developing the exposed layer to obtain a surface which contains regions having no remaining photo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HICKMAN, JAMES J, CALVERT, JEFFREY M, PECKERAR, MARTIN C, REBBERT, MILTON L, GEORGER, JR., JACQUE H
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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