Real time measurement of etch rate during a chemical etching process

A contactless method and apparatus for real-time in-situ monitoring of a chemical etching process during etching of at least one wafer in a wet chemical etchant bath are disclosed. The method comprises the steps of providing two conductive electrodes in the wet chemical bath, wherein the two electro...

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Bibliographische Detailangaben

Hauptverfasser:	RATZLAFF, EUGENE HENRY, HSIAO, YIPING, BARBEE, STEVEN GEORGE, LI, LEPING, HEINZ, TONY FREDERICK, WONG, JUSTIN WAIOW
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SEMICONDUCTOR DEVICES TESTING
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