Resistless methods of fabricating FETs

A method of fabricating semiconductor devices including forming a plurality of layers of semiconductor material on the surface of a substrate, forming a mask without using a resist on the layers which can be disassociated in-situ, removing an unmasked portion of the layers to form a semiconductor de...

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Bibliographische Detailangaben
Hauptverfasser: TSUI, RAYMOND K, SHIRALAGI, KUMAR
Format: Patent
Sprache:eng
Schlagworte:
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