Method and apparatus for detecting defective semiconductor wafers during fabrication thereof

An apparatus and method for detecting burnt resist or mask on the surface of a semiconductor integrated circuit wafer during fabrication thereof. A light source and light sensor are utilized to identify the flat matte surface finish of burnt resist or mask and shut down the fabrication process befor...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HAMILTON, JEFFREY L
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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