Method and apparatus for detecting defective semiconductor wafers during fabrication thereof

An apparatus and method for detecting burnt resist or mask on the surface of a semiconductor integrated circuit wafer during fabrication thereof. A light source and light sensor are utilized to identify the flat matte surface finish of burnt resist or mask and shut down the fabrication process befor...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	HAMILTON, JEFFREY L
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page
container_issue
container_start_page
container_title
container_volume
creator	HAMILTON JEFFREY L
description	An apparatus and method for detecting burnt resist or mask on the surface of a semiconductor integrated circuit wafer during fabrication thereof. A light source and light sensor are utilized to identify the flat matte surface finish of burnt resist or mask and shut down the fabrication process before a large number of semiconductor wafers are ruined. The burnt resist or mask is detected by the lack of reflected light from the surface of the wafer compared with the light reflected from the surface of a known good resist coated wafer.
format	Patent
fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US5444265A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US5444265A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US5444265A3</originalsourceid><addsrcrecordid>eNqFyrEKAjEQhOFrLER9BvMCNpqzF1FsrNROONZk9i6gSUg2-vrmwN5imL_4ps39DBmCVeTrYqREUrLikJSFwIjzfS0e6w2V8XImeFuMVPEhRsrKljQqpkdyhsQFr2RAQuB5M2F6Zix-P2uWx8N1f1ohhg45koGHdLdLq7Veb9vd5r_4AiLfO_o</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method and apparatus for detecting defective semiconductor wafers during fabrication thereof</title><source>esp@cenet</source><creator>HAMILTON; JEFFREY L</creator><creatorcontrib>HAMILTON; JEFFREY L</creatorcontrib><description>An apparatus and method for detecting burnt resist or mask on the surface of a semiconductor integrated circuit wafer during fabrication thereof. A light source and light sensor are utilized to identify the flat matte surface finish of burnt resist or mask and shut down the fabrication process before a large number of semiconductor wafers are ruined. The burnt resist or mask is detected by the lack of reflected light from the surface of the wafer compared with the light reflected from the surface of a known good resist coated wafer.</description><edition>6</edition><language>eng</language><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; PHYSICS ; TESTING</subject><creationdate>1995</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19950822&DB=EPODOC&CC=US&NR=5444265A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19950822&DB=EPODOC&CC=US&NR=5444265A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HAMILTON; JEFFREY L</creatorcontrib><title>Method and apparatus for detecting defective semiconductor wafers during fabrication thereof</title><description>An apparatus and method for detecting burnt resist or mask on the surface of a semiconductor integrated circuit wafer during fabrication thereof. A light source and light sensor are utilized to identify the flat matte surface finish of burnt resist or mask and shut down the fabrication process before a large number of semiconductor wafers are ruined. The burnt resist or mask is detected by the lack of reflected light from the surface of the wafer compared with the light reflected from the surface of a known good resist coated wafer.</description><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1995</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqFyrEKAjEQhOFrLER9BvMCNpqzF1FsrNROONZk9i6gSUg2-vrmwN5imL_4ps39DBmCVeTrYqREUrLikJSFwIjzfS0e6w2V8XImeFuMVPEhRsrKljQqpkdyhsQFr2RAQuB5M2F6Zix-P2uWx8N1f1ohhg45koGHdLdLq7Veb9vd5r_4AiLfO_o</recordid><startdate>19950822</startdate><enddate>19950822</enddate><creator>HAMILTON; JEFFREY L</creator><scope>EVB</scope></search><sort><creationdate>19950822</creationdate><title>Method and apparatus for detecting defective semiconductor wafers during fabrication thereof</title><author>HAMILTON; JEFFREY L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US5444265A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1995</creationdate><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HAMILTON; JEFFREY L</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HAMILTON; JEFFREY L</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and apparatus for detecting defective semiconductor wafers during fabrication thereof</title><date>1995-08-22</date><risdate>1995</risdate><abstract>An apparatus and method for detecting burnt resist or mask on the surface of a semiconductor integrated circuit wafer during fabrication thereof. A light source and light sensor are utilized to identify the flat matte surface finish of burnt resist or mask and shut down the fabrication process before a large number of semiconductor wafers are ruined. The burnt resist or mask is detected by the lack of reflected light from the surface of the wafer compared with the light reflected from the surface of a known good resist coated wafer.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record>
fulltext	fulltext_linktorsrc
identifier
ispartof
issn
language	eng
recordid	cdi_epo_espacenet_US5444265A
source	esp@cenet
subjects	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
title	Method and apparatus for detecting defective semiconductor wafers during fabrication thereof
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-12T00%3A17%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HAMILTON;%20JEFFREY%20L&rft.date=1995-08-22&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS5444265A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true