Method of manufacturing a semiconductor device comprising a capacitor with a ferroelectric dielectric, and semiconductor device comprising such a capacitor

A semiconductor device in which a capacitor (2) is provided on a surface (10) of a semiconductor body (3) with a semiconductor element (1) in which a lower electrode (11), an oxidic ferroelectric dielectric (12) and an upper electrode (13) are provided in that order, the upper electrode not covering...

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Bibliographische Detailangaben
Hauptverfasser: WOLTERS, ROBERTUS A. M, LARSEN, POUL K, ULENAERS, MATHIEU J. E
Format: Patent
Sprache:eng
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