Quantitative analyzing method by a secondary ion mass spectrometric method and a secondary ion mass spectrometer

A quantitative analyzing method by a secondary ion mass spectrometric method comprises the steps of: quantitatively analyzing the target element by the secondary ion mass spectrometric method with respect to a plurality of ion-implanted standard samples, while changing an implantation energy; and co...

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Hauptverfasser: KIMURA, HIDEKI, TANIGAKI, TAKESHIGE, HIRANO, TAKASHI
Format: Patent
Sprache:eng
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Zusammenfassung:A quantitative analyzing method by a secondary ion mass spectrometric method comprises the steps of: quantitatively analyzing the target element by the secondary ion mass spectrometric method with respect to a plurality of ion-implanted standard samples, while changing an implantation energy; and correcting a secondary ion intensity which is obtained with respect to the target element in the surface layer of the sample to be analyzed by the secondary ion mass spectrometric method on the basis of the results of the quantitative analyses with respect to the plurality of standard samples. A secondary ion mass spectrometer having such a function is also disclosed.