Free-radical curable compositions comprising vinyl ether and urethane malenate compounds
A free-radical radiation curable composition comprising: a) at least one compound containing one to six vinyl ether groups; and b) at least one compound containing a urethane backbone with one to six maleate and/or fumarate end groups, wherein the ratio of vinyl ether groups to maleate and/or fumara...
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| creator | NOREN GERRY K VANDEBERG JOHN T KRAJEWSKI JOHN J ZIMMERMAN JOHN M THOMPSON DANNY C SHAMA SAMI A |
| description | A free-radical radiation curable composition comprising: a) at least one compound containing one to six vinyl ether groups; and b) at least one compound containing a urethane backbone with one to six maleate and/or fumarate end groups, wherein the ratio of vinyl ether groups to maleate and/or fumarate groups is in the range of about 1 to about 1:5. |
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SHAMA; SAMI A</creatorcontrib><description>A free-radical radiation curable composition comprising: a) at least one compound containing one to six vinyl ether groups; and b) at least one compound containing a urethane backbone with one to six maleate and/or fumarate end groups, wherein the ratio of vinyl ether groups to maleate and/or fumarate groups is in the range of about 1 to about 1:5.</description><edition>5</edition><language>eng</language><subject>ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; APPARATUS THEREFOR ; CHEMICAL PAINT OR INK REMOVERS ; CHEMICAL TREATMENT OF HIDES, SKINS OR LEATHER, e.g. TANNING,IMPREGNATING, FINISHING ; CHEMISTRY ; CINEMATOGRAPHY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COMPOSITIONS BASED THEREON ; COMPOSITIONS FOR TANNING ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; CORRECTING FLUIDS ; DYES ; ELECTROGRAPHY ; FILLING PASTES ; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC ; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS ; 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DANNY C</creatorcontrib><creatorcontrib>SHAMA; SAMI A</creatorcontrib><title>Free-radical curable compositions comprising vinyl ether and urethane malenate compounds</title><description>A free-radical radiation curable composition comprising: a) at least one compound containing one to six vinyl ether groups; and b) at least one compound containing a urethane backbone with one to six maleate and/or fumarate end groups, wherein the ratio of vinyl ether groups to maleate and/or fumarate groups is in the range of about 1 to about 1:5.</description><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>APPARATUS THEREFOR</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMICAL TREATMENT OF HIDES, SKINS OR LEATHER, e.g. TANNING,IMPREGNATING, FINISHING</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS FOR TANNING</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>FILLING PASTES</subject><subject>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</subject><subject>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</subject><subject>HIDES</subject><subject>HOLOGRAPHY</subject><subject>IMPREGNATING OR COATING OF PAPER</subject><subject>INKS</subject><subject>LEATHER</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PAPER NOT OTHERWISE PROVIDED FOR</subject><subject>PAPER-MAKING</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>PELTS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>PREPARATION THEREOF NOT COVERED BY SUBCLASSES D21C OR D21D</subject><subject>PRODUCTION OF CELLULOSE</subject><subject>PULP COMPOSITIONS</subject><subject>SKINS</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</subject><subject>TEXTILES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>TREATMENT OF FINISHED PAPER NOT COVERED BY CLASS B31 OR SUBCLASS D21G</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1994</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqFizEKAjEQRdNYiHoG5wILQlx7ERd7FeyWMRndgewkZBLB2yuyvdV_D96fm1uXiZqMnh0GcDXjPRC4OKaoXDiK_iSzsjzhxfIOQGWgDCgeav4yCsGIgQTL9KzidWlmDwxKq2kXZt0dL4dTQyn2pAkdCZX-em7tdrNr7d7-Lz4fejp0</recordid><startdate>19940823</startdate><enddate>19940823</enddate><creator>NOREN; GERRY K</creator><creator>VANDEBERG; JOHN T</creator><creator>KRAJEWSKI; JOHN J</creator><creator>ZIMMERMAN; JOHN M</creator><creator>THOMPSON; DANNY C</creator><creator>SHAMA; SAMI A</creator><scope>EVB</scope></search><sort><creationdate>19940823</creationdate><title>Free-radical curable compositions comprising vinyl ether and urethane malenate compounds</title><author>NOREN; GERRY K ; VANDEBERG; JOHN T ; KRAJEWSKI; JOHN J ; ZIMMERMAN; JOHN M ; THOMPSON; DANNY C ; SHAMA; SAMI A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US5340653A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1994</creationdate><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>APPARATUS THEREFOR</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMICAL TREATMENT OF HIDES, SKINS OR LEATHER, e.g. TANNING,IMPREGNATING, FINISHING</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS FOR TANNING</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>FILLING PASTES</topic><topic>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</topic><topic>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</topic><topic>HIDES</topic><topic>HOLOGRAPHY</topic><topic>IMPREGNATING OR COATING OF PAPER</topic><topic>INKS</topic><topic>LEATHER</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PAPER NOT OTHERWISE PROVIDED FOR</topic><topic>PAPER-MAKING</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>PELTS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>PREPARATION THEREOF NOT COVERED BY SUBCLASSES D21C OR D21D</topic><topic>PRODUCTION OF CELLULOSE</topic><topic>PULP COMPOSITIONS</topic><topic>SKINS</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</topic><topic>TEXTILES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>TREATMENT OF FINISHED PAPER NOT COVERED BY CLASS B31 OR SUBCLASS D21G</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>NOREN; GERRY K</creatorcontrib><creatorcontrib>VANDEBERG; JOHN T</creatorcontrib><creatorcontrib>KRAJEWSKI; JOHN J</creatorcontrib><creatorcontrib>ZIMMERMAN; JOHN M</creatorcontrib><creatorcontrib>THOMPSON; DANNY C</creatorcontrib><creatorcontrib>SHAMA; SAMI A</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NOREN; GERRY K</au><au>VANDEBERG; JOHN T</au><au>KRAJEWSKI; JOHN J</au><au>ZIMMERMAN; JOHN M</au><au>THOMPSON; DANNY C</au><au>SHAMA; SAMI A</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Free-radical curable compositions comprising vinyl ether and urethane malenate compounds</title><date>1994-08-23</date><risdate>1994</risdate><abstract>A free-radical radiation curable composition comprising: a) at least one compound containing one to six vinyl ether groups; and b) at least one compound containing a urethane backbone with one to six maleate and/or fumarate end groups, wherein the ratio of vinyl ether groups to maleate and/or fumarate groups is in the range of about 1 to about 1:5.</abstract><edition>5</edition><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR APPARATUS THEREFOR CHEMICAL PAINT OR INK REMOVERS CHEMICAL TREATMENT OF HIDES, SKINS OR LEATHER, e.g. TANNING,IMPREGNATING, FINISHING CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON COMPOSITIONS FOR TANNING COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CORRECTING FLUIDS DYES ELECTROGRAPHY FILLING PASTES GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HIDES HOLOGRAPHY IMPREGNATING OR COATING OF PAPER INKS LEATHER MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PAPER NOT OTHERWISE PROVIDED FOR PAPER-MAKING PASTES OR SOLIDS FOR COLOURING OR PRINTING PELTS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES PREPARATION THEREOF NOT COVERED BY SUBCLASSES D21C OR D21D PRODUCTION OF CELLULOSE PULP COMPOSITIONS SKINS TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TEXTILES THEIR PREPARATION OR CHEMICAL WORKING-UP TREATMENT OF FINISHED PAPER NOT COVERED BY CLASS B31 OR SUBCLASS D21G USE OF MATERIALS THEREFOR WOODSTAINS |
| title | Free-radical curable compositions comprising vinyl ether and urethane malenate compounds |
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