Adhesive system for reducing the likelihood of particulate

A system for reducing the generation of particulate in the use of an optical pellicle is disclosed. The system is designed for use with a pellicle having a pellicle membrane with an underside and an upper side, and a pellicle frame having inner, outer, top and bottom sides. The underside of the pell...

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Hauptverfasser:	YEN, YUNG-TSAI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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creator	YEN YUNG-TSAI
description	A system for reducing the generation of particulate in the use of an optical pellicle is disclosed. The system is designed for use with a pellicle having a pellicle membrane with an underside and an upper side, and a pellicle frame having inner, outer, top and bottom sides. The underside of the pellicle membrane is tensed over and bonded to the top of the pellicle frame. A first adhesive layer coating is applied to the inner side of the pellicle frame and extends continuously over the top of the pellicle frame. This reduces the likelihood of a generation of particulate as a result of improper formation of the adhesive layer, or as a result of degradation of the adhesive layer over time. It is normal that this first adhesive layer cover substantially all of the inner and outer surfaces of the pellicle frame. In one embodiment of the present invention, the first adhesive layer also extends continuously across the underside of the pellicle membrane.
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The system is designed for use with a pellicle having a pellicle membrane with an underside and an upper side, and a pellicle frame having inner, outer, top and bottom sides. The underside of the pellicle membrane is tensed over and bonded to the top of the pellicle frame. A first adhesive layer coating is applied to the inner side of the pellicle frame and extends continuously over the top of the pellicle frame. This reduces the likelihood of a generation of particulate as a result of improper formation of the adhesive layer, or as a result of degradation of the adhesive layer over time. It is normal that this first adhesive layer cover substantially all of the inner and outer surfaces of the pellicle frame. 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The system is designed for use with a pellicle having a pellicle membrane with an underside and an upper side, and a pellicle frame having inner, outer, top and bottom sides. The underside of the pellicle membrane is tensed over and bonded to the top of the pellicle frame. A first adhesive layer coating is applied to the inner side of the pellicle frame and extends continuously over the top of the pellicle frame. This reduces the likelihood of a generation of particulate as a result of improper formation of the adhesive layer, or as a result of degradation of the adhesive layer over time. It is normal that this first adhesive layer cover substantially all of the inner and outer surfaces of the pellicle frame. In one embodiment of the present invention, the first adhesive layer also extends continuously across the underside of the pellicle membrane.</abstract><edition>5</edition><oa>free_for_read</oa></addata></record>
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subjects	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
title	Adhesive system for reducing the likelihood of particulate
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