Polyarylene sulfide resin composition
A polyarylenesulfide resin composition manufactured by compounding polyarylenesulfide resin with one or more ester-based compounds selected from the groups of compounds shown in the following formulas (1) and (2): (* CHEMICAL STRUCTURE *) (1) where R1 to R4 are such that at least one of them is an a...
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creator | KAWASHIMA KIYOTAKA NAGANO SHIGEAKI |
description | A polyarylenesulfide resin composition manufactured by compounding polyarylenesulfide resin with one or more ester-based compounds selected from the groups of compounds shown in the following formulas (1) and (2): (* CHEMICAL STRUCTURE *) (1) where R1 to R4 are such that at least one of them is an alkyl or alkenyl group of 10-40 carbon atoms, the remaining Rs represent -H, -OH, alkyl, or aryl radicals, and 1.0 |
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COMPOSITIONS BASED THEREON ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><creationdate>1994</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19940412&DB=EPODOC&CC=US&NR=5302651A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19940412&DB=EPODOC&CC=US&NR=5302651A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAWASHIMA; KIYOTAKA</creatorcontrib><creatorcontrib>NAGANO; SHIGEAKI</creatorcontrib><title>Polyarylene sulfide resin composition</title><description>A polyarylenesulfide resin composition manufactured by compounding polyarylenesulfide resin with one or more ester-based compounds selected from the groups of compounds shown in the following formulas (1) and (2): (* CHEMICAL STRUCTURE *) (1) where R1 to R4 are such that at least one of them is an alkyl or alkenyl group of 10-40 carbon atoms, the remaining Rs represent -H, -OH, alkyl, or aryl radicals, and 1.0<m<6.0 (* CHEMICAL STRUCTURE *) (2) (R5 = CnH2n+1, 40 <= n <= 70.</description><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1994</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFANyM-pTCyqzEnNS1UoLs1Jy0xJVShKLc7MU0jOzy3IL84syczP42FgTUvMKU7lhdLcDPJuriHOHrqpBfnxqcUFiclA7SXxocGmxgZGZqaGjsaEVQAA6vQnFw</recordid><startdate>19940412</startdate><enddate>19940412</enddate><creator>KAWASHIMA; KIYOTAKA</creator><creator>NAGANO; SHIGEAKI</creator><scope>EVB</scope></search><sort><creationdate>19940412</creationdate><title>Polyarylene sulfide resin composition</title><author>KAWASHIMA; KIYOTAKA ; NAGANO; SHIGEAKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US5302651A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1994</creationdate><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>KAWASHIMA; KIYOTAKA</creatorcontrib><creatorcontrib>NAGANO; SHIGEAKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAWASHIMA; KIYOTAKA</au><au>NAGANO; SHIGEAKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Polyarylene sulfide resin composition</title><date>1994-04-12</date><risdate>1994</risdate><abstract>A polyarylenesulfide resin composition manufactured by compounding polyarylenesulfide resin with one or more ester-based compounds selected from the groups of compounds shown in the following formulas (1) and (2): (* CHEMICAL STRUCTURE *) (1) where R1 to R4 are such that at least one of them is an alkyl or alkenyl group of 10-40 carbon atoms, the remaining Rs represent -H, -OH, alkyl, or aryl radicals, and 1.0<m<6.0 (* CHEMICAL STRUCTURE *) (2) (R5 = CnH2n+1, 40 <= n <= 70.</abstract><edition>5</edition><oa>free_for_read</oa></addata></record> |
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subjects | CHEMISTRY COMPOSITIONS BASED THEREON METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS |
title | Polyarylene sulfide resin composition |
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