Method of selectively monitoring trace constituents in plating baths

A method of selectively monitoring particular trace constituents within a plating bath containing multiple trace constituents. The method provides improved selectivity over known voltammetric techniques for certain plating baths and trace constituents. The method involves applying a brief voltammetr...

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Bibliographische Detailangaben

Hauptverfasser:	ELIASH, BRUCE M
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY PHYSICS PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS TESTING
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