Method for the making of an optoelectronic device

Method for the making of an optoelectronic device

Disclosed is a method for the making of an optoelectronic device such as buried lasers in which the different layers of the device are chiefly made during a single step of epitaxy by means of a removable mechanical mask.

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Hauptverfasser: GARCIA, JEANARLES, HIRTZ, JEAN-PIERRE, MAUREL, PHILIPPE
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator GARCIA
JEANARLES
HIRTZ
JEAN-PIERRE
MAUREL
PHILIPPE
description Disclosed is a method for the making of an optoelectronic device such as buried lasers in which the different layers of the device are chiefly made during a single step of epitaxy by means of a removable mechanical mask.
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subjects BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Method for the making of an optoelectronic device
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