Focused ion beam for thin film resistor trim on aluminum nitride substrates
A method for trimming thin film resistors. A focused inert ion beam is employed to selectively remove portions of a resistive film deposited on a substrate.
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| creator | LAU JAMES C LOWERY MAURICE LUI KENNETH |
| description | A method for trimming thin film resistors. A focused inert ion beam is employed to selectively remove portions of a resistive film deposited on a substrate. |
| format | Patent |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY RESISTORS SEMICONDUCTOR DEVICES |
| title | Focused ion beam for thin film resistor trim on aluminum nitride substrates |
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