Automatic high speed optical inspection system
In each configuration, at least one TDI sensor is used to image substrate portions of interest, with those portions illuminated with substantially uniform illumination. In one configuration, a substrate is compared to prestored expected characteristic features. In a second configuration, first and s...
Gespeichert in:
Hauptverfasser: | , , , , , , , , , , , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | FEIN MICHAEL E TUCKER, III FRANCIS D CHADWICK CURT H SHOLES ROBERT R BELL WILLIAM GREENE JOHN D JANN P. C HARVEY DAVID J |
description | In each configuration, at least one TDI sensor is used to image substrate portions of interest, with those portions illuminated with substantially uniform illumination. In one configuration, a substrate is compared to prestored expected characteristic features. In a second configuration, first and second patterns in a region of the surface of at least one substrate are inspected by comparing one pattern against the other and noting whether they agree with each other. This is accomplished by illuminating the two patterns, imaging the first pattern and storing its characteristics in a temporary memory, then imaging the second pattern and comparing it to the stored characteristics from the temporary memory. Then the comparisons continue sequentially with the second pattern becoming the first pattern in the next imaging/comparison sequence against a new second pattern. Each time the comparison is performed, it is noted whether or not there has been agreement between the two patterns and which two patterns where compared. This inspection technique is useful for doing die-to-die inspections. A variation of the second configuration uses two TDI sensors to simultaneously image the first and second patterns, thus eliminating the need for temporary memory. In this configuration, the two patterns are simultaneously imaged and compared, then additional patterns are compared sequentially, in the same manner with the results of the comparisons and the pattern locations stored to determine which patterns are bad when the inspection of all patterns is completed. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US5131755A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US5131755A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US5131755A3</originalsourceid><addsrcrecordid>eNrjZNBzLC3Jz00syUxWyMhMz1AoLkhNTVHILwAKJOYoZOYB-cklmfl5CsWVxSWpuTwMrGmJOcWpvFCam0HezTXE2UM3tSA_PrW4IDE5NS-1JD402NTQ2NDc1NTRmLAKAHikKjo</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Automatic high speed optical inspection system</title><source>esp@cenet</source><creator>FEIN; MICHAEL E ; TUCKER, III; FRANCIS D ; CHADWICK; CURT H ; SHOLES; ROBERT R ; BELL; WILLIAM ; GREENE; JOHN D ; JANN; P. C ; HARVEY; DAVID J</creator><creatorcontrib>FEIN; MICHAEL E ; TUCKER, III; FRANCIS D ; CHADWICK; CURT H ; SHOLES; ROBERT R ; BELL; WILLIAM ; GREENE; JOHN D ; JANN; P. C ; HARVEY; DAVID J</creatorcontrib><description>In each configuration, at least one TDI sensor is used to image substrate portions of interest, with those portions illuminated with substantially uniform illumination. In one configuration, a substrate is compared to prestored expected characteristic features. In a second configuration, first and second patterns in a region of the surface of at least one substrate are inspected by comparing one pattern against the other and noting whether they agree with each other. This is accomplished by illuminating the two patterns, imaging the first pattern and storing its characteristics in a temporary memory, then imaging the second pattern and comparing it to the stored characteristics from the temporary memory. Then the comparisons continue sequentially with the second pattern becoming the first pattern in the next imaging/comparison sequence against a new second pattern. Each time the comparison is performed, it is noted whether or not there has been agreement between the two patterns and which two patterns where compared. This inspection technique is useful for doing die-to-die inspections. A variation of the second configuration uses two TDI sensors to simultaneously image the first and second patterns, thus eliminating the need for temporary memory. In this configuration, the two patterns are simultaneously imaged and compared, then additional patterns are compared sequentially, in the same manner with the results of the comparisons and the pattern locations stored to determine which patterns are bad when the inspection of all patterns is completed.</description><language>eng</language><subject>CALCULATING ; COMPUTING ; COUNTING ; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING ELECTRIC VARIABLES ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; MEASURING MAGNETIC VARIABLES ; PHYSICS ; TESTING</subject><creationdate>1992</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19920721&DB=EPODOC&CC=US&NR=5131755A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19920721&DB=EPODOC&CC=US&NR=5131755A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FEIN; MICHAEL E</creatorcontrib><creatorcontrib>TUCKER, III; FRANCIS D</creatorcontrib><creatorcontrib>CHADWICK; CURT H</creatorcontrib><creatorcontrib>SHOLES; ROBERT R</creatorcontrib><creatorcontrib>BELL; WILLIAM</creatorcontrib><creatorcontrib>GREENE; JOHN D</creatorcontrib><creatorcontrib>JANN; P. C</creatorcontrib><creatorcontrib>HARVEY; DAVID J</creatorcontrib><title>Automatic high speed optical inspection system</title><description>In each configuration, at least one TDI sensor is used to image substrate portions of interest, with those portions illuminated with substantially uniform illumination. In one configuration, a substrate is compared to prestored expected characteristic features. In a second configuration, first and second patterns in a region of the surface of at least one substrate are inspected by comparing one pattern against the other and noting whether they agree with each other. This is accomplished by illuminating the two patterns, imaging the first pattern and storing its characteristics in a temporary memory, then imaging the second pattern and comparing it to the stored characteristics from the temporary memory. Then the comparisons continue sequentially with the second pattern becoming the first pattern in the next imaging/comparison sequence against a new second pattern. Each time the comparison is performed, it is noted whether or not there has been agreement between the two patterns and which two patterns where compared. This inspection technique is useful for doing die-to-die inspections. A variation of the second configuration uses two TDI sensors to simultaneously image the first and second patterns, thus eliminating the need for temporary memory. In this configuration, the two patterns are simultaneously imaged and compared, then additional patterns are compared sequentially, in the same manner with the results of the comparisons and the pattern locations stored to determine which patterns are bad when the inspection of all patterns is completed.</description><subject>CALCULATING</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING ELECTRIC VARIABLES</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>MEASURING MAGNETIC VARIABLES</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1992</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBzLC3Jz00syUxWyMhMz1AoLkhNTVHILwAKJOYoZOYB-cklmfl5CsWVxSWpuTwMrGmJOcWpvFCam0HezTXE2UM3tSA_PrW4IDE5NS-1JD402NTQ2NDc1NTRmLAKAHikKjo</recordid><startdate>19920721</startdate><enddate>19920721</enddate><creator>FEIN; MICHAEL E</creator><creator>TUCKER, III; FRANCIS D</creator><creator>CHADWICK; CURT H</creator><creator>SHOLES; ROBERT R</creator><creator>BELL; WILLIAM</creator><creator>GREENE; JOHN D</creator><creator>JANN; P. C</creator><creator>HARVEY; DAVID J</creator><scope>EVB</scope></search><sort><creationdate>19920721</creationdate><title>Automatic high speed optical inspection system</title><author>FEIN; MICHAEL E ; TUCKER, III; FRANCIS D ; CHADWICK; CURT H ; SHOLES; ROBERT R ; BELL; WILLIAM ; GREENE; JOHN D ; JANN; P. C ; HARVEY; DAVID J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US5131755A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1992</creationdate><topic>CALCULATING</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING ELECTRIC VARIABLES</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>MEASURING MAGNETIC VARIABLES</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>FEIN; MICHAEL E</creatorcontrib><creatorcontrib>TUCKER, III; FRANCIS D</creatorcontrib><creatorcontrib>CHADWICK; CURT H</creatorcontrib><creatorcontrib>SHOLES; ROBERT R</creatorcontrib><creatorcontrib>BELL; WILLIAM</creatorcontrib><creatorcontrib>GREENE; JOHN D</creatorcontrib><creatorcontrib>JANN; P. C</creatorcontrib><creatorcontrib>HARVEY; DAVID J</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FEIN; MICHAEL E</au><au>TUCKER, III; FRANCIS D</au><au>CHADWICK; CURT H</au><au>SHOLES; ROBERT R</au><au>BELL; WILLIAM</au><au>GREENE; JOHN D</au><au>JANN; P. C</au><au>HARVEY; DAVID J</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Automatic high speed optical inspection system</title><date>1992-07-21</date><risdate>1992</risdate><abstract>In each configuration, at least one TDI sensor is used to image substrate portions of interest, with those portions illuminated with substantially uniform illumination. In one configuration, a substrate is compared to prestored expected characteristic features. In a second configuration, first and second patterns in a region of the surface of at least one substrate are inspected by comparing one pattern against the other and noting whether they agree with each other. This is accomplished by illuminating the two patterns, imaging the first pattern and storing its characteristics in a temporary memory, then imaging the second pattern and comparing it to the stored characteristics from the temporary memory. Then the comparisons continue sequentially with the second pattern becoming the first pattern in the next imaging/comparison sequence against a new second pattern. Each time the comparison is performed, it is noted whether or not there has been agreement between the two patterns and which two patterns where compared. This inspection technique is useful for doing die-to-die inspections. A variation of the second configuration uses two TDI sensors to simultaneously image the first and second patterns, thus eliminating the need for temporary memory. In this configuration, the two patterns are simultaneously imaged and compared, then additional patterns are compared sequentially, in the same manner with the results of the comparisons and the pattern locations stored to determine which patterns are bad when the inspection of all patterns is completed.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US5131755A |
source | esp@cenet |
subjects | CALCULATING COMPUTING COUNTING IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING ELECTRIC VARIABLES MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS MEASURING MAGNETIC VARIABLES PHYSICS TESTING |
title | Automatic high speed optical inspection system |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T22%3A35%3A29IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=FEIN;%20MICHAEL%20E&rft.date=1992-07-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS5131755A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |