N{HU 2{B -Naphthalenesulfonyl-L-arginine derivatives, and the pharmaceutically acceptable acid addition salts thereof
N2-naphthalenesulfonyl-L-arginine amides having the formula or the acid addition salts thereof with a pharmaceutically acceptable acid wherein R1 is alkenyl of not more than 10 carbon atoms, or substituted alkyl containing not more than 20 carbon atoms wherein said substituent is a member selected f...
Gespeichert in:
Hauptverfasser: | , , , , , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | TONOMURA SHINJI OHKUBO KAZUO KIKUMOTO RYOJI TAMAO YOSHIKUNO OKAMOTO SHOSUKE |
description | N2-naphthalenesulfonyl-L-arginine amides having the formula or the acid addition salts thereof with a pharmaceutically acceptable acid wherein R1 is alkenyl of not more than 10 carbon atoms, or substituted alkyl containing not more than 20 carbon atoms wherein said substituent is a member selected from the class consisting of alkoxy, alkoxycarbonyl, arylcarbamoyl acyl, acyloxy, N,N-polymethylenecarbamoyl and carboxy, and R2 is aryl, cycloalkyl, aralkyl or cycloalkylalkyl, respectively containing not more than 15 carbon atoms and R' is 1-naphthyl substituted with a member selected from the class consisting of 2-dialkylamino, 3-dialkylamino, 4-dialkylamino, 6-dialkylamino, 7-dialkylamino, 8-dialkylamino, respectively containing not more than 20 carbon atoms, and 5-dialkylamino containing 3-20 carbon atoms; or 2-naphthyl substituted with dialkylamino containing not more than 20 carbon atoms. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US4168307A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US4168307A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US4168307A3</originalsourceid><addsrcrecordid>eNqFjLEKwjAURbs4iPoNvg8woFbUVUXpIF20szyTVxOISUheC6U_bwV3p3uGc-44a8q-qGDdH0GUGDRrtOQoNbb2rrPiKjC-jDOOQFE0LbJpKS0AnQLWBEFjfKOkho1EaztAKSkwPi0NaBSgUoaNd5DQcvo2kXw9zUY12kSz306y-eV8PxWCgn9QCsOjI35Ut81qu8-Xu0P-3_gAge9EXA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>N{HU 2{B -Naphthalenesulfonyl-L-arginine derivatives, and the pharmaceutically acceptable acid addition salts thereof</title><source>esp@cenet</source><creator>TONOMURA; SHINJI ; OHKUBO; KAZUO ; KIKUMOTO; RYOJI ; TAMAO; YOSHIKUNO ; OKAMOTO; SHOSUKE</creator><creatorcontrib>TONOMURA; SHINJI ; OHKUBO; KAZUO ; KIKUMOTO; RYOJI ; TAMAO; YOSHIKUNO ; OKAMOTO; SHOSUKE</creatorcontrib><description>N2-naphthalenesulfonyl-L-arginine amides having the formula or the acid addition salts thereof with a pharmaceutically acceptable acid wherein R1 is alkenyl of not more than 10 carbon atoms, or substituted alkyl containing not more than 20 carbon atoms wherein said substituent is a member selected from the class consisting of alkoxy, alkoxycarbonyl, arylcarbamoyl acyl, acyloxy, N,N-polymethylenecarbamoyl and carboxy, and R2 is aryl, cycloalkyl, aralkyl or cycloalkylalkyl, respectively containing not more than 15 carbon atoms and R' is 1-naphthyl substituted with a member selected from the class consisting of 2-dialkylamino, 3-dialkylamino, 4-dialkylamino, 6-dialkylamino, 7-dialkylamino, 8-dialkylamino, respectively containing not more than 20 carbon atoms, and 5-dialkylamino containing 3-20 carbon atoms; or 2-naphthyl substituted with dialkylamino containing not more than 20 carbon atoms.</description><language>eng</language><subject>CHEMISTRY ; HETEROCYCLIC COMPOUNDS ; HUMAN NECESSITIES ; HYGIENE ; MEDICAL OR VETERINARY SCIENCE ; METALLURGY ; ORGANIC CHEMISTRY ; PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES</subject><creationdate>1979</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19790918&DB=EPODOC&CC=US&NR=4168307A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19790918&DB=EPODOC&CC=US&NR=4168307A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TONOMURA; SHINJI</creatorcontrib><creatorcontrib>OHKUBO; KAZUO</creatorcontrib><creatorcontrib>KIKUMOTO; RYOJI</creatorcontrib><creatorcontrib>TAMAO; YOSHIKUNO</creatorcontrib><creatorcontrib>OKAMOTO; SHOSUKE</creatorcontrib><title>N{HU 2{B -Naphthalenesulfonyl-L-arginine derivatives, and the pharmaceutically acceptable acid addition salts thereof</title><description>N2-naphthalenesulfonyl-L-arginine amides having the formula or the acid addition salts thereof with a pharmaceutically acceptable acid wherein R1 is alkenyl of not more than 10 carbon atoms, or substituted alkyl containing not more than 20 carbon atoms wherein said substituent is a member selected from the class consisting of alkoxy, alkoxycarbonyl, arylcarbamoyl acyl, acyloxy, N,N-polymethylenecarbamoyl and carboxy, and R2 is aryl, cycloalkyl, aralkyl or cycloalkylalkyl, respectively containing not more than 15 carbon atoms and R' is 1-naphthyl substituted with a member selected from the class consisting of 2-dialkylamino, 3-dialkylamino, 4-dialkylamino, 6-dialkylamino, 7-dialkylamino, 8-dialkylamino, respectively containing not more than 20 carbon atoms, and 5-dialkylamino containing 3-20 carbon atoms; or 2-naphthyl substituted with dialkylamino containing not more than 20 carbon atoms.</description><subject>CHEMISTRY</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>HUMAN NECESSITIES</subject><subject>HYGIENE</subject><subject>MEDICAL OR VETERINARY SCIENCE</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1979</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqFjLEKwjAURbs4iPoNvg8woFbUVUXpIF20szyTVxOISUheC6U_bwV3p3uGc-44a8q-qGDdH0GUGDRrtOQoNbb2rrPiKjC-jDOOQFE0LbJpKS0AnQLWBEFjfKOkho1EaztAKSkwPi0NaBSgUoaNd5DQcvo2kXw9zUY12kSz306y-eV8PxWCgn9QCsOjI35Ut81qu8-Xu0P-3_gAge9EXA</recordid><startdate>19790918</startdate><enddate>19790918</enddate><creator>TONOMURA; SHINJI</creator><creator>OHKUBO; KAZUO</creator><creator>KIKUMOTO; RYOJI</creator><creator>TAMAO; YOSHIKUNO</creator><creator>OKAMOTO; SHOSUKE</creator><scope>EVB</scope></search><sort><creationdate>19790918</creationdate><title>N{HU 2{B -Naphthalenesulfonyl-L-arginine derivatives, and the pharmaceutically acceptable acid addition salts thereof</title><author>TONOMURA; SHINJI ; OHKUBO; KAZUO ; KIKUMOTO; RYOJI ; TAMAO; YOSHIKUNO ; OKAMOTO; SHOSUKE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US4168307A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1979</creationdate><topic>CHEMISTRY</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>HUMAN NECESSITIES</topic><topic>HYGIENE</topic><topic>MEDICAL OR VETERINARY SCIENCE</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES</topic><toplevel>online_resources</toplevel><creatorcontrib>TONOMURA; SHINJI</creatorcontrib><creatorcontrib>OHKUBO; KAZUO</creatorcontrib><creatorcontrib>KIKUMOTO; RYOJI</creatorcontrib><creatorcontrib>TAMAO; YOSHIKUNO</creatorcontrib><creatorcontrib>OKAMOTO; SHOSUKE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TONOMURA; SHINJI</au><au>OHKUBO; KAZUO</au><au>KIKUMOTO; RYOJI</au><au>TAMAO; YOSHIKUNO</au><au>OKAMOTO; SHOSUKE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>N{HU 2{B -Naphthalenesulfonyl-L-arginine derivatives, and the pharmaceutically acceptable acid addition salts thereof</title><date>1979-09-18</date><risdate>1979</risdate><abstract>N2-naphthalenesulfonyl-L-arginine amides having the formula or the acid addition salts thereof with a pharmaceutically acceptable acid wherein R1 is alkenyl of not more than 10 carbon atoms, or substituted alkyl containing not more than 20 carbon atoms wherein said substituent is a member selected from the class consisting of alkoxy, alkoxycarbonyl, arylcarbamoyl acyl, acyloxy, N,N-polymethylenecarbamoyl and carboxy, and R2 is aryl, cycloalkyl, aralkyl or cycloalkylalkyl, respectively containing not more than 15 carbon atoms and R' is 1-naphthyl substituted with a member selected from the class consisting of 2-dialkylamino, 3-dialkylamino, 4-dialkylamino, 6-dialkylamino, 7-dialkylamino, 8-dialkylamino, respectively containing not more than 20 carbon atoms, and 5-dialkylamino containing 3-20 carbon atoms; or 2-naphthyl substituted with dialkylamino containing not more than 20 carbon atoms.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US4168307A |
source | esp@cenet |
subjects | CHEMISTRY HETEROCYCLIC COMPOUNDS HUMAN NECESSITIES HYGIENE MEDICAL OR VETERINARY SCIENCE METALLURGY ORGANIC CHEMISTRY PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES |
title | N{HU 2{B -Naphthalenesulfonyl-L-arginine derivatives, and the pharmaceutically acceptable acid addition salts thereof |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T21%3A24%3A55IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TONOMURA;%20SHINJI&rft.date=1979-09-18&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS4168307A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |