METHOD AND COMPOSITION FOR PRODUCING BRIGHT PALLADIUM ELECTRODEPOSITIONS
A composition for producing adherent deposits of palladium from cyanide-free bath uses small amounts of cobalt or nickel or the combination thereof as the brightener. The bath employs as an electrolyte alkali metal and ammoni-um sulfates, sulfamates, phosphates, nitrates, nitrites and mixtures there...
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creator | ZOBBI ROBERT G SKOMOROSKI ROBERT M |
description | A composition for producing adherent deposits of palladium from cyanide-free bath uses small amounts of cobalt or nickel or the combination thereof as the brightener. The bath employs as an electrolyte alkali metal and ammoni-um sulfates, sulfamates, phosphates, nitrates, nitrites and mixtures thereof. Preferably, the brightener concentration is 0.004-0.02 gram mole per liter nickel or 0.002-0.04 gram mole per liter cobalt, or the combination thereof. Cetyltrimethylammonium bromide is an optional component for the bath which is maintained at a pH of 7.5-11.0 and at a temperature of 28.degree.-80.degree. Centigrade. For barrel plating, the current density is 0.05-0.5 amperes per square decimeterand for rack plating the current density is 0.2-2.0 amperes per square decimeter. |
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The bath employs as an electrolyte alkali metal and ammoni-um sulfates, sulfamates, phosphates, nitrates, nitrites and mixtures thereof. Preferably, the brightener concentration is 0.004-0.02 gram mole per liter nickel or 0.002-0.04 gram mole per liter cobalt, or the combination thereof. Cetyltrimethylammonium bromide is an optional component for the bath which is maintained at a pH of 7.5-11.0 and at a temperature of 28.degree.-80.degree. Centigrade. For barrel plating, the current density is 0.05-0.5 amperes per square decimeterand for rack plating the current density is 0.2-2.0 amperes per square decimeter.</description><language>eng</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>1975</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19751209&DB=EPODOC&CC=US&NR=3925170A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19751209&DB=EPODOC&CC=US&NR=3925170A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZOBBI; ROBERT G</creatorcontrib><creatorcontrib>SKOMOROSKI; ROBERT M</creatorcontrib><title>METHOD AND COMPOSITION FOR PRODUCING BRIGHT PALLADIUM ELECTRODEPOSITIONS</title><description>A composition for producing adherent deposits of palladium from cyanide-free bath uses small amounts of cobalt or nickel or the combination thereof as the brightener. The bath employs as an electrolyte alkali metal and ammoni-um sulfates, sulfamates, phosphates, nitrates, nitrites and mixtures thereof. Preferably, the brightener concentration is 0.004-0.02 gram mole per liter nickel or 0.002-0.04 gram mole per liter cobalt, or the combination thereof. Cetyltrimethylammonium bromide is an optional component for the bath which is maintained at a pH of 7.5-11.0 and at a temperature of 28.degree.-80.degree. Centigrade. 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The bath employs as an electrolyte alkali metal and ammoni-um sulfates, sulfamates, phosphates, nitrates, nitrites and mixtures thereof. Preferably, the brightener concentration is 0.004-0.02 gram mole per liter nickel or 0.002-0.04 gram mole per liter cobalt, or the combination thereof. Cetyltrimethylammonium bromide is an optional component for the bath which is maintained at a pH of 7.5-11.0 and at a temperature of 28.degree.-80.degree. Centigrade. For barrel plating, the current density is 0.05-0.5 amperes per square decimeterand for rack plating the current density is 0.2-2.0 amperes per square decimeter.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS |
title | METHOD AND COMPOSITION FOR PRODUCING BRIGHT PALLADIUM ELECTRODEPOSITIONS |
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