Formation of composite oxides on III-V semiconductors

A method of forming a composite oxide on III-V compound semiconductors is disclosed. An oxidizable metal such as Al, Ni, Ta, Ti, Zn or alloys including said metals is deposited on the surface of the semiconductor or on a native oxide grown on the semiconductor. The structure is subjected to an elect...

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Bibliographische Detailangaben
Hauptverfasser: WEIGLE, GREGORY DYETT, SPITZER, STUART MARSHALL, SCHWARTZ, BERTRAM
Format: Patent
Sprache:eng
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